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SOC3810HRT bảng dữ liệu(PDF) 6 Page - STMicroelectronics

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3
Radiation hardness assurance
This products is guaranteed in radiation as per ESCC 22900 and in compliance with ESCC 5207/005
specification.
Each lot is tested in radiation according to the following procedure::
•
Radiation condition of 0.1 rad (Si)/s
•
Test of 11 samples by wafer, 5 biased at 80% of V(BR)CEO, 5 unbiased and for reference
•
Acceptance criteria of each wafer at 100 krad if all 10 samples comply with the post radiation electrical
characteristics as per Table 4.
•
Radiation verification test (RVT) report is delivered with the lot manufactured with the wafer of the tested
samples
RVT includes the value of each parameter at 30, 50, 70 and 100 krad (Si), post annealing at 24 hour / 25°C and
post annealing at 168 hours / 100°C.
Table 4. ESCC5207/005 post radiation electrical characteristics
Symbol
Parameter
Test conditions
Min.
Max
Unit
ICBO
Collector cut-off current (IE=0)
VCB= 60 V
10
nA
IEBO
Emitter cut-off current (IC= 0)
VEB = 4 V
20
nA
V(BR)CBO
Collector-base breakdown voltage (IE= 0)
IC=10 μA
60
V
V(BR)CEO(1)
IC = 10 mA
60
V
V(BR)EBO
Emitter-base breakdown voltage (IC= 0)
IE = 10 μA
5
V
VCE(sat)(1)
Collector-emitter saturation voltage
IC=100 μA, IB = 10 μA
0.2
V
IC= 1 mA, IB = 100 μA
0.25
VBE(sat)(1)
Base-emitter saturation voltage
IC=100 μA, IB = 10 μA
0.7
V
IC= 1 mA, IB = 100 μA
0.8
[hFE](1)
Post irradiation gain calculation (2)
IC= 10 μA, VCE= 5 V
[50]
IC= 100 μA, VCE= 5 V
[75]
450
IC= 500 μA, VCE= 5 V
[75]
450
IC= 1 mA, VCE= 5 V
[75]
450
IC= 10 mA, VCE= 5 V
[65]
1. Pulsed duration = 300 μs, duty cycle ≥ 2 %
2. The post-irradiation gain calculation of [hFE], made using hFE measurements from prior to and on completion of irradiation
testing and after each annealing step if any, shall be as specified in MILSTD-750 method 1019.
2N3810HR
Radiation hardness assurance
DS6098 - Rev 9
page 6/14



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